Focusing and leveling system capable of timely compensating wave-front distortion and compensation method thereof
A technology of focusing and leveling, wavefront distortion, applied in the field of lithography, can solve the problems affecting measurement accuracy, spot position shift, disturbance, etc.
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[0049] figure 2 Shown is a schematic structural view of the focusing and leveling system according to the present invention. The system inserts a closed-loop system into the existing focusing and leveling optical path. The closed-loop system consists of a wavefront sensor 3-2, a wavefront controller 3 -5 and wavefront corrector 3-4 are composed of three parts, such as image 3 shown.
[0050] Among them, the wavefront sensor 3-2 is used to detect wavefront errors in real time. The wavefront sensor 3-2 should have high precision and weak light detection capability. For example, a dynamic Hartmann-Shack wavefront sensor can be used, which consists of a microlens array 4-1 and an array detector 4-2. Figure 4 for its schematic diagram.
[0051] The wavefront controllers 3-5 are mainly used for wavefront restoration and generation of control signals.
[0052] The wavefront corrector 3-4 is mainly used to convert the control signal provided by the wavefront controller 3-5 int...
no. 2 example
[0088] The entire closed-loop system in another embodiment of the present invention consists of three parts: a wavefront sensor, a wavefront controller and a wavefront corrector, wherein the wavefront sensor and wavefront controller are similar to those of the first embodiment. Wavefront correctors 3-4 employ Figure 7 structure shown. It is made up of a plurality of small mirrors that can be independently translated or translated and tilted, and has a relatively large dynamic range of the wavefront. It can achieve high-speed and high-precision optical mirror surface shape change, translation or rotation angle under external control, thereby changing the wavefront phase of the optical system.
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