The invention discloses a preparation method of an 
evaporation material with low 
refractive index. The preparation method comprises the steps of material preparation, material mixing, 
slurry drying, press forming, sintered body preparation and cleaning and packaging. The preparation method is reasonable in design and convenient to operate, materials are subjected to wet ball-milling in a 
planet ball mill with water as a mixing medium, shorter ball-milling time is taken, and 
slurry with uniform and consistent components is obtained. The 
evaporation material prepared with the preparation method has the advantages as follows: splashing caused by light weight of the electronic gun bombardment 
evaporation material can be avoided; the density is large, the 
gas release amount in the 
coating process is reduced, and thus, the 
membrane layer quality is improved; the surface is a 
diffusion reflection plane, the evaporation angels are consistent, the 
evaporation rate is uniform and stable, and an electronic gun can be focused easily; the surface of the evaporation material is subjected to ultra-cleaning treatment and is clean, dust cannot fall off easily, and 
sputtering points can be avoided during 
coating.