Provided is a photosensitive 
conductive paste which is capable of suppressing / preventing the occurrence of 
delamination between a conductor layer and an insulating layer even in cases where this photosensitive 
conductive paste is used for the formation of the conductor layer if a multilayer 
electronic component having a conductor layer and an internal conductor layer is produced by an integral firing process, and which enables fine patterning. This photosensitive 
conductive paste contains (a) a conductive 
powder in an amount of from 70.3% by 
mass to 85.6% by 
mass (inclusive) of the total 
mass of the paste, (b) a photosensitive resin composition containing an alkali-
soluble polymer, a photosensitive 
monomer, a photopolymerization initiator and a 
solvent, and (c) a glass 
frit, and this photosensitive conductive paste is configured so as to satisfy such requirements that the 
mass ratio of the glass 
frit to the conductive paste, namely (glass 
frit / conductive paste) is from 0.020 to 0.054 (inclusive) and the 
softening point of the glass frit is not lower than the 
sintering initiation temperature of the conductive 
powder. As the glass frit, one having a 
softening point of 560 DEG C or more is used.