Current regulation diode chip and manufacturing method thereof
A technology of current regulation and diodes, which is applied in semiconductor/solid-state device manufacturing, circuits, electrical components, etc. It can solve the problems of small anode area, short circuit, and inability to achieve low-cost packaging, and achieve the effect of convenient packaging
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[0023] The following is attached figure 2 to attach Figure 9 Embodiments of the present invention are further described in detail.
[0024] The present invention is a current regulating diode chip, which includes a substrate layer 1 and an epitaxial layer 1a covering it, and selects an applicable special-shaped epitaxial wafer according to the parameter requirements of the CRD and the height of the mesa. In this embodiment, the epitaxial layer 1a It is N-type, and the substrate layer 1 is highly doped P-type.
[0025] A drain region 2 is formed on the epitaxial layer 1a, and the surface of the drain region 2 is further provided with a first ohmic contact diffusion layer 8 and a first metal layer 10 covering the first ohmic contact diffusion layer 8 .
[0026] The drain region 2 is in the shape of a mesa, and its height is greater than 2 microns. The mesa shape is etched on the epitaxial layer by the method of silicon homogeneous etching or anisotropic etching. The function...
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