The invention is directed to an arrangement for metering target material for the generation of short-
wavelength electromagnetic radiation from an energy beam induced 
plasma, in particular X 
radiation and EUV 
radiation. The object of the invention is to find a novel possibility for metering target material for the generation of short-
wavelength electromagnetic radiation from an energy beam induced 
plasma which makes it possible to provide reproducibly supplied 
mass-limited targets in such a way that only the amount of target material for 
plasma generation that can be effectively converted to radiating plasma in the desired 
wavelength region arrives in the interaction chamber and, therefore, debris generation and the gas burden in the interaction chamber are minimized. This object is met, according to the invention, in that an 
injection device is provided for target generation, wherein means are arranged upstream of the 
nozzle in a 
nozzle chamber for a defined, temporary 
pressure increase in order to introduce an individual target into the interaction chamber exclusively when required, and an 
antechamber is arranged around the 
nozzle for generating a quasistatic pressure upstream of the interaction chamber, wherein an equilibrium pressure in the 
antechamber prevents the escape of target material as long as there is no 
pressure increase in the nozzle chamber.