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33 results about "Aggradation" patented technology
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Aggradation (or alluviation) is the term used in geology for the increase in land elevation, typically in a river system, due to the deposition of sediment. Aggradation occurs in areas in which the supply of sediment is greater than the amount of material that the system is able to transport. The mass balance between sediment being transported and sediment in the bed is described by the Exner equation.
A cultivating method for producing snowflower beef
ActiveCN101156563AAbundant resourcesImprove the accuracy of slaughter judgmentFood processingAnimal feeding stuffAnimal ForagingAggradation
The invention discloses a fattening method for the cattle making snowflake beef. The nine month old stock calves of 270 plus or minus 30 kg weight are selected for fattening and breeding according to the following fattening and weighting procedure 1 or the fattening and weighting procedure 2, and the fattening degree value is calculated according to the following formula: the fattening degree value is equal to the (weight / stature) multiply 100. When the fattening degree value is more than or equal to the fattening degree critical value of the cattle variety in a fattening degree critical value table, then the cattle can be put into market, and then the cattle which can make snowflake beef is obtained. By giving the nutrition requirement value and the forage feeding value in each fattening stage, the invention integrates the deeper and difficult growth physiological rule of the bones, the muscles, and the adipose of the cattle, and the technologies of nutrition metabolizing and controlling organically, and simplifies into a forage prescription and the control of the forage taking value. The invention can naturally conduct regulating, and can ensure bones, muscles, and adipose to get maximum development and aggradation during the peak period of the growth. The forage prescription can be changed freely by the executor of the invention according to the classification of the forage material and the price change, and the cost of the forage is controllable.
Owner:CHINA AGRI UNIV
Treatment method of recent dredger-fill silt foundation
ActiveCN102817348AShorten the drainage distanceShorten discharge timeSoil preservationAggradationEngineering
The invention relates to the field of building foundations, in particular to a treatment method of a recent dredger-fill silt foundation. The treatment method of the recent dredger-fill silt foundation includes three phases, namely surface vacuum dewatering joint-preloading, vacuum joint preloading and composite foundation. The treatment method is characterized by including the steps: in surface vacuum dewatering joint-preloading, treating the foundation by a, zoning; b, spreading a vacuum dewatering joint-preloading cushion; c, spreading a film and d, evacuating; in vacuum joint preloading, treating the foundation by a, spreading drain boards; b, spreading a film; c, performing vacuum joint preloading and d, performing low-energy forced ramming or impact rolling; and in the phase of composite foundation, adopting conventional composite foundation methods. The treatment method is safe in construction, short in construction period, effective in foundation treatment, low in construction cost, especially suitable for projects of land aggradation by reclamation, which are super-high in water content and ultralow in strength and need instant foundation treatment after filling.
Owner:BAOSTEEL ENG & TECH GRP
A method for making CDSEM calibration sample
InactiveCN101009236AExtend working lifeSemiconductor/solid-state device testing/measurementSemiconductor/solid-state device manufacturingResistAggradation
A manufacturing method of measuring key size of scanning electronic microscope (CDSEM) calibration sample includes pre-cleanout of silicon underlay, forming underlay oxidizing layer, accumulating multi crystal silicon layer, forming photosensitive resist pattern, forming gate structure, forming a conducting layer. Gate structure sample gained restrains the aggradation of hydrocarbon induced by cumulation of surface charge for the abreaction effect of conducting layer, so the phenomenon of overloading of CD grown is eliminated to make service life of the calibration sample prolong apparently and guarantee the reliability of test of CDSEM.
Owner:SEMICON MFG INT (SHANGHAI) CORP +1
Non-distortion repairing method for micro-damage of casting alloy part
InactiveCN101444869ALow heat inputInstant high temperatureArc welding apparatusCrazingElectric discharge
The invention discloses a non-distortion repairing method for micro-damage of casting alloy part. In the method, a revolving solid anode bar made from CoCrW alloy is clamped on a rotary collet of an electric discharge machine, and spare parts to be repaired are connected with the cathode of the electric discharge machine; the power of the electric discharge machine is adjusted between 1000W and 1800W, and the frequency is adjusted into low frequency; shield argon is adjusted between 8L / min and 35L / min, and argon in an argon bottle is guided to a coating part by a copper pipe; a dipped finish of the copper pipe aims damage parts of the spare parts; after the power is turned on, the rotary cathode bar and the damage surfaces of the spare parts are contacted with degrees between 55 degrees and 75 degrees, and reciprocating coating is carried out at repairing parts. The method uses the characters of high transient temperature and short endurance time of electric spark micro-arc aggradation to reduce heat input in the repairing of spare parts, thereby avoiding the defects of great heat input amount of argon-arc welding, long acting time, much deformation of spare parts and easy generation of cracks in the prior art. The method overcomes the problems of border effect of plasma spraying, great investment cost of devices, low bonding strength of coating, easy plunger separation and chip off-falling for hot spraying in the prior art.
Owner:PLA NO 5719 FACTORY
Coastal wetland surface elevation dynamic change and aggradation speed measurement method
ActiveCN105987681ARealize measurementEasy to makeHeight/levelling measurementAggradationMeasurement point
The invention belongs to the field of elevation measurement methods and particularly relates to a coastal wetland surface elevation dynamic change and aggradation speed measurement method which is used for measuring a surface aggradation region or erosion region and includes the steps of: (1) fixing a surface elevation measuring instrument at a measurement point; (2) arranging a level mark layer on the measurement point; (3) arranging a vertical dyed sand rod at the measurement point, wherein the top of the sand rod is coincided with a depositional surface; and (4) after a certain time t, reading the surface elevation measuring instrument to acquire surface elevation change S. Compared with the prior art, the method is suitable for surface elevation measurement in a coastal wetland complex region and is not liable to lose in measurement capability just because erosion. The method can achieve the surface elevation measurement no matter how the surface elevation is changed in height, so that the method has a wider application range and more accurate data results. Preparation of the dyed sand rod is simple, economical and convenient.
Owner:QINGDAO INST OF MARINE GEOLOGY
Multifunctional scouring resistance sand blocking dike
ActiveCN105464042AReduce flow rateConducive to siltClimate change adaptationStream regulationAggradationReinforced concrete
The invention discloses a multifunctional scouring resistance sand blocking dike which comprises a wall body made of cast-in-place reinforced concrete. The longitudinal section of the wall body is of a right-angled trapezoidal structure. The bottom foundation of the wall body is of a tooth plate structure. The inclined wall face, located on the upper stream side, of the upper portion of the wall body is fixedly connected with a water permeable baffle extending towards the upper stream side. The water permeable baffle is provided with multiple vertical water permeable holes in the vertical direction. Multiple horizontal water permeable units are arranged on the portion, between the water permeable baffle and a river bed, of the wall body. Each horizontal water permeable unit is formed by multiple rectangular horizontal water permeable holes at up-down intervals. The portion, located at each horizontal water permeable unit, on the inclined wall face of the upper stream side is covered with water permeable geotechnical cloth, and the water permeable geotechnical cloth is fixed to the inclined wall face on the upper stream side through a steel wire net frame. By the adoption of the multifunctional scouring resistance sand blocking dike, the flow speed of the upper stream side of the sand blocking dike is lowered, and fine sediment aggradation is facilitated; and the sand blocking wall body share the dike top excess flow, so that the back-water height of the front of the dike is lowered, the water flow energy below the dike is weakened, and the scouring effect on the sand blocking underwater bed is weakened.
Owner:YELLOW RIVER ENG CONSULTING
Method for producing compressive nitrifier layer and method for forming transistor
ActiveCN101064254AIncrease bombardmentIncrease the efficacy of the etch process windowSemiconductor/solid-state device manufacturingKryptonAggradation
A preparing method of compressibility nitride layer includes preceding a chemical gas phase aggradation to form a nitride layer on a base, it characterized in that definite gas is inlet into during the chemical gas phase aggradation, the definite gas is argon, nitrogen, krypton and xenon or their comnination. For adding said definite gas, the compress stress can be decreased, and the PMOS drive current plus is increased.
Owner:UNITED MICROELECTRONICS CORP
Surface modification method for ruthenium in situ wrapping ultramicro high purity Si3N4 powder
The present invention discloses an improved method with a ruthenium enveloped with super-micro and high-pure Si3N4 powder; because of the much less grain diameter of the super-micro and high-pure Si3N4 powder, the powder is easy to be reunited after being collected. The present invention is characterized in that: the method uses the super-micro powder to compose in the high-distributed situation in the lasting stage to make the chemical treatment on the surface directly; a ruthenium amorphism phase much inerter to oxidation is enveloped on the surface of the high-distributed one-off Si3N4 grain; the improved method on the surface of super-micro powder is with the especial advantage, which can not only improve the distribution character for the super-micro powder and avoid the hard solid reuniting, but also can change the physical and chemical performance for the powder surface. The material satisfies the requirement of the grain size for silicon nitride. The method can add the component separately and evenly in the farthest degree without needing other expensive device and establishment; the method has the advantages of simple technical and low cost; the method can enchance the density of the elementary blank and the baking activity; compared with the physical phase aggradation method, chemical phase aggradation, vacuum spraying and ion plating and so on, the method is with much lower cost.
Owner:ZHEJIANG SCI-TECH UNIV
Water-entering adaptive adjusting sewage outfall device
InactiveCN101158177AEliminate or slow entryAvoid recontaminationSewerage structuresSewage drainingAggradationSewage outfall
The invention discloses a self-adaptive adjustment pollutant-discharge port device for entering the water body, comprising a float pool, a fixed pier, an anchoring bar, a floating drum, a flexible soft connection pipe, a connector, a sewage inlet pipe, and a sewage outlet pipe; the float pool is arranged beside a bank, the middle and the lower parts of one side of a pool wall that is near a riverbed is provided with a through groove, and the width of the groove is matched with the pipe diameter of the sewage outlet pipe; the number of the fixed piers is two, the piers are respectively arranged on the bottom of the pool; the anchoring bar is fixedly connected on the fixed pier and extends vertically onto the top of the float pool; the floating drum is actively connected on the anchoring bar via the casing rings at the two sides; the flexible soft connection pipe is connected between the sewage inlet pipe and the sewage outlet pipe; the sewage inlet pipe is connected with a pollutant-discharge pipe or is connected with an open channel via an aggradation pool; the sewage outlet pipe is connected with the floating drum via the connector, and the water outlet end is arranged in the flowing water body. The sewage outlet pipe of the invention can move upward and downward with the change of water level, thus making the discharged sewage be at the optimal waterpower intersection position, diffuse and transport rapidly, and avoiding the problem of re-pollution.
Owner:SICHUAN UNIV
Biological fish specimen shaping method
ActiveCN104392653AKeep the original appearanceImprove protectionEducational modelsAggradationAbsorbent cotton
The invention discloses a biological fish specimen shaping method, and relates to biological fish specimens. The biological fish specimen shaping method comprises the following steps: screening out fine sand, washing the fine sand with water to remove aggradation, and airing for use; killing a biological fish sample to be shaped, removing inner organs, wiping out redundant water after cleaning, filling the biological fish sample with clean absorbent cotton balls, and keeping the fish body wet; spreading a layer of the fine sand at the bottom of a container, placing the treated biological fish sample onto the fine sand, reversely dragging the biological fish sample in the fine sand by grasping a tail fin of the biological fish sample, expanding pectoral fins, dorsal fins and pelvic fins of the biological fish sample under the action of the resistance of the fine sand to ensure that gaps are naturally adhered and filled with the fine sand and the fins do not shrink any longer so as to finish an expanding process, burying the biological fish sample with the fine sand completely, drying the biological fish sample buried in the fine sand together with the container, taking out the biological fish sample, and removing the fine sand and dust from the surface of the biological fish sample to obtain the shaped biological fish sample; spraying the surface of the shaped biological fish sample with a transparent coating, and drying to finish shaping of the biological fish specimen.
Owner:海口百川海洋生物科技有限公司
A cultivating method for producing snowflower beef
ActiveCN101156563BAbundant resourcesImprove the accuracy of slaughter judgmentFood processingAnimal feeding stuffAggradationAnimal Foraging
Owner:CHINA AGRI UNIV
Preparation method of polymeric aluminum magnesium chloride flocculating agent for treatment of printing and dyeing waste water
InactiveCN106882859AReduce processing costsGood flocculation effectWaste water treatment from animal processingWaste water treatment from food industryAcid dissolutionBauxite
The invention discloses a preparation method of a polyaluminum magnesium chloride flocculant used for the treatment of printing and dyeing wastewater, which comprises the following steps in sequence: adding an appropriate amount of hydrochloric acid and distilled water into a three-necked flask equipped with a reflux condenser, heating and reacting to a certain temperature, Add crushed (200 mesh) roasted bauxite and appropriate amount of distilled water, and continue to stir the reaction. During this process, the aluminum ions in the bauxite are continuously dissolved. After a certain period of reaction, add Appropriate amount of magnesium oxide powder and distilled water, continue to heat and stir to react for a period of time, stop heating, cool, and sink for 24 hours, the reaction liquid is the prepared polyaluminum magnesium chloride flocculant. The polyaluminium-magnesium chloride flocculant product obtained by the invention has simple process, low cost and good performance, rationally utilizes resources, creates objective profit margins, and has good industrial prospects.
Owner:营口镁质材料研究院有限公司
Flattening active driving TFT matrix structure and method of manufacture
ActiveCN101064316AReduce disconnectionFacilitate depositionSolid-state devicesSemiconductor/solid-state device manufacturingAggradationInsulation layer
The invention discloses a flat active drive TFT matrix configuration that comprises: base board, grating line, and gate electrode and gate insulation layer, it characterized in that: said grating line and gate electrode are covered onto the base board by the gate insulation layer, the upper surface of the gate insulation layer is flat, semiconductor layer, source electrode and drain electrode and pixel electrode are all formed on the gate insulation layer. The invention also discloses method of producing the flat active drive TFT matrix configuration. The flat insulation surface formed in the invention is propitious to aggradation of later active layer, source and drain metal layer, passivation layer and pixel electrode layer, and reduces the generation of metal fault line. At the same time, flat gate electrode insulation surface can reduce the form of inner stress of the gate insulation layer, and increase the ratio of the finished product.
Owner:BEIJING BOE OPTOELECTRONCIS TECH CO LTD +1
Machine arrangement for dust-free chamber production program
InactiveCN1567089AReduce utilizationFunction increaseSemiconductor/solid-state device manufacturingFlexible article cleaningAggradationBaseboard
This invention is about a kind of producing procedure machine configuration of clean room. It assorts with at least one baseboard. It comprises: several exposure machines, which used for exposure producing procedure to the base board; several aggradation machines, which used for aggradation producing procedure to the base board; several etching cleaning integration machines, each of them is located between the exposure machine and aggradation machine, and used for etching, cleaning producing procedure to the base board; as well as OHS apparatus, which spans the exposure machine, aggradation machine and etching cleaning integration machine and on the top of them, and used for transportation the base board from the exposure machine, aggradation machine to the etching cleaning integration machine.
Owner:AU OPTRONICS CORP
Mini-acoustical device based on magneto resistor effect
InactiveCN1571582BHigh sensitivityReduce noiseGalvano-magnetic devicesTransducer detailsDiaphragm structureSilicon dioxide
The invention discloses a tiny acoustics device, which is based on magnetoelectric effect. The invention belongs to semiconductor device field. The device is composed by movable diaphragm structure which has aggradation of hard magnetism film, and immovable structure which has aggradation of magnetic resistor several layers films. The movable diaphragm structure is composed from bottom to top by silicon underlay, silicon dioxide, silicon nitride layer, permanent magnetic material layer and silicon dioxide layer, the structure of immovable is same to the movable part, besides changing the permanent magnetic material layer to GMR magnetic resistor several layers film. The invention achieves diversion of electronic signal and acoustic signal between movable diaphragm film and magnetic resistor several layers films, so the tiny acoustics device which has high sensitivity, low yawp, wide range of response, and the following dealing circuit is very simple, because the technologic step is simple, the character of product is reliable, the rate of finished products is high, and is suitable to requirement of volume-produce.
Owner:TSINGHUA UNIV
Method and device for detecting pollution degree of lubricating oil
InactiveCN101196510BAccurately grasp the status of quality declineGrasp the situation of quality declineMaterial analysis by optical meansMaterial testing goodsAggradationDiffusion
The invention provides a method and device for inspecting the degree of contamination of the lubricant, the method of which comprises: make the lubricant speckle mapping; make imaging to the above mapping by camera; transform the above mapping image to gray level image; measure the gray value A of the diffusion ring, the gray value B of the aggradation ring, the gray value C of the oil control ring and the gray value D of the filter paper in the above gray level image, as well as measure the diameter E of the diffusion ring and the diameter F of the oil control ring; calculate the three values of the measurement parameters Alpha, Sd and Wd which reflects the degree of contamination of the lubricant according to the above gray values and diameters, wherein, the Alpha is equal to F / E, Sd isequal to LgB-LgA and the Wd is equal to LgD-LgC; determine the degree of contamination of the lubricant based on the values of the Alpha, Sd and Wd. The device provided in the invention comprises a plainstage, imaging unit, image processing unit, calculating unit and display unit. The method and device for inspecting the degree of contamination of the lubricant provided in the invention has the advantages of fast processing speed and high precision measurement.
Owner:SHENZHEN YATEKS OPTICAL ELECTRONICS TECH CO LTD
Lifting mechanism of physical gas-phase deposition
InactiveCN1940128AReduce electrostatic damageReduce wearVacuum evaporation coatingSputtering coatingAggradationGas phase
A kind of physics gas phase aggradation promotion and demotion organization, it includes a glass board load base, a promotion and demotion device which is fixed in both ends of the glass board load base, and a falcula which is linked in the promotion and demotion device. The falcula includes a ceramic main body, the ceramic main body includes one fore-end and one trailing end, an electric conduction film covers in the surface of the ceramic main body, and a metal plate links in the fore-end of the ceramic main body.
Owner:CHUNGHWA PICTURE TUBES LTD
Flattening active driving TFT matrix structure and method of manufacturing the same
ActiveCN100463191CReduce disconnectionFacilitate depositionSolid-state devicesSemiconductor/solid-state device manufacturingAggradationGrating
The invention discloses a flat active drive TFT matrix configuration that comprises: base board, grating line, and gate electrode and gate insulation layer, it characterized in that: said grating line and gate electrode are covered onto the base board by the gate insulation layer, the upper surface of the gate insulation layer is flat, semiconductor layer, source electrode and drain electrode and pixel electrode are all formed on the gate insulation layer. The invention also discloses method of producing the flat active drive TFT matrix configuration. The flat insulation surface formed in the invention is propitious to aggradation of later active layer, source and drain metal layer, passivation layer and pixel electrode layer, and reduces the generation of metal fault line. At the same time, flat gate electrode insulation surface can reduce the form of inner stress of the gate insulation layer, and increase the ratio of the finished product.
Owner:BEIJING BOE OPTOELECTRONCIS TECH CO LTD +1
Lifting mechanism of physical gas-phase deposition
InactiveCN100476019CReduce electrostatic damageReduce wearVacuum evaporation coatingSputtering coatingAggradationGas phase
A kind of physics gas phase aggradation promotion and demotion organization, it includes a glass board load base, a promotion and demotion device which is fixed in both ends of the glass board load base, and a falcula which is linked in the promotion and demotion device. The falcula includes a ceramic main body, the ceramic main body includes one fore-end and one trailing end, an electric conduction film covers in the surface of the ceramic main body, and a metal plate links in the fore-end of the ceramic main body.
Owner:CHUNGHWA PICTURE TUBES LTD
Multifunctional anti-scouring sand bar
ActiveCN105464042BReduce flow rateConducive to siltClimate change adaptationStream regulationAggradationReinforced concrete
The invention discloses a multifunctional scouring resistance sand blocking dike which comprises a wall body made of cast-in-place reinforced concrete. The longitudinal section of the wall body is of a right-angled trapezoidal structure. The bottom foundation of the wall body is of a tooth plate structure. The inclined wall face, located on the upper stream side, of the upper portion of the wall body is fixedly connected with a water permeable baffle extending towards the upper stream side. The water permeable baffle is provided with multiple vertical water permeable holes in the vertical direction. Multiple horizontal water permeable units are arranged on the portion, between the water permeable baffle and a river bed, of the wall body. Each horizontal water permeable unit is formed by multiple rectangular horizontal water permeable holes at up-down intervals. The portion, located at each horizontal water permeable unit, on the inclined wall face of the upper stream side is covered with water permeable geotechnical cloth, and the water permeable geotechnical cloth is fixed to the inclined wall face on the upper stream side through a steel wire net frame. By the adoption of the multifunctional scouring resistance sand blocking dike, the flow speed of the upper stream side of the sand blocking dike is lowered, and fine sediment aggradation is facilitated; and the sand blocking wall body share the dike top excess flow, so that the back-water height of the front of the dike is lowered, the water flow energy below the dike is weakened, and the scouring effect on the sand blocking underwater bed is weakened.
Owner:YELLOW RIVER ENG CONSULTING
Quantitative characterization method of low-position domain land frame edge delta
ActiveCN113343161ARich research methodsThe result is accurateGeological measurementsComplex mathematical operationsAggradationPosition domain
The invention discloses a quantitative characterization method for a low-level domain land frame edge delta, and the method comprises the following steps: selecting a profile of a target delta, and dividing a three-level sequence interface of the target delta through employing a seismic termination relation based on a classical sequence stratigraphy theory; in the three-level sequence interface, identifying a first upper super point, a first lower super point and a maximum initial sea pan surface angle change point of the initial sea pan surface on the three-level sequence interface; reading time values of the three points, and converting the time values into depth values by using a time-depth conversion formula; calculating the product distance of the delta according to the depth value; calculating the progradation distance of the delta according to the plane positions of the three points; calculating the gradient of the delta according to the aggradation distance and the progradation distance; and determining the type of the delta according to the calculation result of the gradient. According to the method, the types of the land frame edge delta in the low-position domain can be quantitatively divided, and technical support is provided for deep water deposition research.
Owner:SOUTHWEST PETROLEUM UNIV
Surface modification method for ruthenium in situ wrapping ultramicro high purity Si3N4 powder
The present invention discloses an improved method with a ruthenium enveloped with super-micro and high-pure Si3N4 powder; because of the much less grain diameter of the super-micro and high-pure Si3N4 powder, the powder is easy to be reunited after being collected. The present invention is characterized in that: the method uses the super-micro powder to compose in the high-distributed situation in the lasting stage to make the chemical treatment on the surface directly; a ruthenium amorphism phase much inerter to oxidation is enveloped on the surface of the high-distributed one-off Si3N4 grain; the improved method on the surface of super-micro powder is with the especial advantage, which can not only improve the distribution character for the super-micro powder and avoid the hard solid reuniting, but also can change the physical and chemical performance for the powder surface. The material satisfies the requirement of the grain size for silicon nitride. The method can add the component separately and evenly in the farthest degree without needing other expensive device and establishment; the method has the advantages of simple technical and low cost; the method can enchance the density of the elementary blank and the baking activity; compared with the physical phase aggradation method, chemical phase aggradation, vacuum spraying and ion plating and so on, the method is with much lower cost.
Owner:ZHEJIANG SCI-TECH UNIV
Hai permanent deformation method comprising in-situ aggradation step of negative ions or amphoteric polymer
The present disclosure relates to a process for permanently reshaping hair, comprising: applying, to an area to be reshaped, a solution comprising at least one polymer chosen from anionic and amphoteric polymers in a medium comprising water and, optionally, at least one cosmetically acceptable solvent, applying, to the area treated in step (a), a reducing composition comprising at least one reducing agent that is capable of cleaving disulfide linkages of the hair and a sufficient amount of ions chosen from metal cations and ammonium ions to precipitate in situ the at least one polymer, shaping the hair in the area treated, followed by a leave-in time for the reducing composition, applying, to the area treated in steps (a) and (b), a fixing composition comprising at least one oxidizing agent, followed by a leave-in time for the fixing composition, and rinsing the hair, and also to a multi-component agent and a multi-compartment kit for the same.
Owner:LOREAL SA
A method for making CDSEM calibration sample
InactiveCN100483663CExtend working lifeSemiconductor/solid-state device testing/measurementSemiconductor/solid-state device manufacturingResistAggradation
A manufacturing method of measuring key size of scanning electronic microscope (CDSEM) calibration sample includes pre-cleanout of silicon underlay, forming underlay oxidizing layer, accumulating multi crystal silicon layer, forming photosensitive resist pattern, forming gate structure, forming a conducting layer. Gate structure sample gained restrains the aggradation of hydrocarbon induced by cumulation of surface charge for the abreaction effect of conducting layer, so the phenomenon of overloading of CD grown is eliminated to make service life of the calibration sample prolong apparently and guarantee the reliability of test of CDSEM.
Owner:SEMICON MFG INT (SHANGHAI) CORP +1
Process for plasma strengthening type chemical vapour phase deposition treatment
ActiveCN1313640CAvoid formingAdd passivation stepChemical vapor deposition coatingAggradationSurface reaction
The invention relates to a plasma-strengthening chemical gas phase aggradation method and is used in depositting film on the surface of the semiconductor wafer. It includes: stabilization, inputting the premonitory gas into the reaction kettle; aggradation, inputting the radio frequency energy, premonitory gas and reacton gas into the reaction kettle; passivation, stopping inputting the reaction gas but still inputting the readio frequency energy; and air bleeding, turning off the radio frequency energy, stopping inputting the premonitory gas and pumping the remaining gas out of the reaction kettle. During the passivation, the radio frequency energy is same with or less than that in the aggradation and we still input the premonitory gas for 3 to 15 minutes. Because the invention adds the passivation to it makes the Si which does not react with other on the surface of the wafer continue reacting till the end, it can eliminate the incomplete surface reaction and hanging keys, thus avoids the protuberant block in the film, eliminates the disadvantage and increases the yield.
Owner:SEMICON MFG INT (SHANGHAI) CORP +1
PMOS tube production method capable of improving instability of negative temperature
InactiveCN100585817CReduced adverse effects of negative temperature instabilityNegative Temperature Instability MitigationSemiconductor/solid-state device manufacturingDeposition temperatureAggradation
The invention provides a method for preparing a PMOS pipe which can improve the negative-temperature instability. In the prior art, when a silicon nitride etching and stopping layer is prepared, hydrogen-silicon keys which are formed in silicon nitride by adopting nitrogen with higher temperature and larger flow are less, thus, the hydrogen on an interface is easy to diffuse, and consequently, the PMOS pipe has the phenomenon by the influence of NBT1 that the Vt excursion is larger, and Idsat is larger. The method for preparing the PMOS pipe comprises the following steps: the trap injection is firstly carried out; next, a grid insulating layer, a grid and a lightly doped drain structure are prepared; then, the side wall of the grid and a source-drain electrode are prepared; and next, the silicon nitride etching and stopping layer is prepared, wherein the flow range of the nitrogen is from 0 to 10 standard state milliliters / minute, the aggradation temperature range is from 390 to 410 DEG C, then, metal front media is prepared, and a contact hole is prepared according to the silicon nitride etching and stopping layer; and finally, a metal plug and a metal layer are prepared. The negative-temperature instability of the PMOS pipe can be obviously improved by the method of the invention, and the Vt excursion and the Idsat of the PMOS pipe are correspondingly reduced.
Owner:SEMICON MFG INT (SHANGHAI) CORP +1
Method and system for operating physical gas-phase deposition
InactiveCN100460557CIncrease productionEasy to useVacuum evaporation coatingSputtering coatingAggradationGas phase
Owner:SEMICON MFG INT (SHANGHAI) CORP +1
Newly Filled Sludge Foundation Treatment Method
The invention relates to the field of building foundations, in particular to a treatment method of a recent dredger-fill silt foundation. The treatment method of the recent dredger-fill silt foundation includes three phases, namely surface vacuum dewatering joint-preloading, vacuum joint preloading and composite foundation. The treatment method is characterized by including the steps: in surface vacuum dewatering joint-preloading, treating the foundation by a, zoning; b, spreading a vacuum dewatering joint-preloading cushion; c, spreading a film and d, evacuating; in vacuum joint preloading, treating the foundation by a, spreading drain boards; b, spreading a film; c, performing vacuum joint preloading and d, performing low-energy forced ramming or impact rolling; and in the phase of composite foundation, adopting conventional composite foundation methods. The treatment method is safe in construction, short in construction period, effective in foundation treatment, low in construction cost, especially suitable for projects of land aggradation by reclamation, which are super-high in water content and ultralow in strength and need instant foundation treatment after filling.
Owner:BAOSTEEL ENG & TECH GRP
Water-entering adaptive adjusting sewage outfall device
InactiveCN101158177BEliminate or slow entryAvoid recontaminationSewerage structuresSewage drainingAggradationSewage outfall
The invention discloses a self-adaptive adjustment pollutant-discharge port device for entering the water body, comprising a float pool, a fixed pier, an anchoring bar, a floating drum, a flexible soft connection pipe, a connector, a sewage inlet pipe, and a sewage outlet pipe; the float pool is arranged beside a bank, the middle and the lower parts of one side of a pool wall that is near a riverbed is provided with a through groove, and the width of the groove is matched with the pipe diameter of the sewage outlet pipe; the number of the fixed piers is two, the piers are respectively arranged on the bottom of the pool; the anchoring bar is fixedly connected on the fixed pier and extends vertically onto the top of the float pool; the floating drum is actively connected on the anchoring bar via the casing rings at the two sides; the flexible soft connection pipe is connected between the sewage inlet pipe and the sewage outlet pipe; the sewage inlet pipe is connected with a pollutant-discharge pipe or is connected with an open channel via an aggradation pool; the sewage outlet pipe is connected with the floating drum via the connector, and the water outlet end is arranged in the flowing water body. The sewage outlet pipe of the invention can move upward and downward with the change of water level, thus making the discharged sewage be at the optimal waterpower intersection position, diffuse and transport rapidly, and avoiding the problem of re-pollution.
Owner:SICHUAN UNIV
Method and system for operating physical gas-phase deposition
InactiveCN1940124AIncrease productionEasy to useVacuum evaporation coatingSputtering coatingAggradationGas phase
This invention provides a kind of method that using the physics gas phase aggradation process semiconductor crystal round, including laying underlayment in the pedestal of the reaction room. The surface of the underlayment draws near the target material that in the reaction room. Target material includes the first face and second face which are set to the surface of the underlayment. The method includes operating the magnet component which is fixed around the revolution component, the revolution component is coupled with the reaction room and coupled with the driving motor and the driving motor is coupled to the drive. The magnet component is put in the place with destine dimension from the centre area of the revolution component. The method includes the magnet component which moves around the centre area by making use of the revolution component. The magnet component rotates with the speed v and affects the space covered in the second surface of the target. The method includes gaining information which relates to the magnet component, the electromagnetic field is relevant to the moving magnet component. The method includes handling information to ascertain if the electromagnetic field is in the preconcert parameter. It transmits the signal to drive to adjust magnet component speed and then to change the electromagnetic field.
Owner:SEMICON MFG INT (SHANGHAI) CORP +1
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